Schedule

Technical Program

The AVS 19th International Conference on Atomic Layer Deposition (ALD 2019) featuring the 6th International Atomic Layer Etching Workshop (ALE 2019) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2019 Workshop (ALE 2019), so that attendees can interact freely. The conference will take place Sunday, July 21-Wednesday, July 24, 2019, at the Hyatt Regency Bellevue in Bellevue, Washington (East Seattle).

As in past conferences, the meeting will be preceded (Sunday, July 21) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 22-24) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 800+.

Awards: Both ALD 2019 and ALE 2019 will recognize student achievement with awards for the best student posters and/or talks. See Awards Page

ALD & ALE Tutorial Speakers and Schedule

Sunday, July 21, 2019

1:00-1:05	Tutorial Welcome
1:05-1:50	Area-selective ALD for Semiconductor Manufacturing Stacey Bent (Stanford University, USA) View Abstract
1:50-2:35	ALD for Battery Applications Andy Sun (Western University, Canada) View Abstract
2:35-3:20	ALD for Catalysis Rong Chen (Huazhong University of Science and Technology, China) View Abstract
3:20-3:40	Break
3:40-4:25	ALD for Photovoltaics Bart Macco (Eindhoven University of Technology, Netherlands) View Abstract
4:25-5:10	Plasma Based ALE Thorsten Lill, (Lam Research, USA) View Abstract
5:10-5:55	Thermal Based ALE Steve George (University of Colorado at Boulder, USA) View Abstract

ALD & ALE Plenary Speakers and Schedule

Monday, July 22, 2019

8:30-8:45	ALD Opening Remarks and ALD Innovation Award Presentation
8:45-9:30	“ALD Innovation Awardee Lecture: “Atomic Scale Processing: From Understanding to Innovation” Erwin Kessels (Eindhoven University of Technology, The Netherlands)
9:30-10:15	“Elucidating the Mechanisms for Atomic Layer Growth through In Situ Studies” Jeff Elam (Argonne National Lab, USA)
10:15-10:45	Break
10:45-11:00	ALE Opening Remarks
11:00-11:45	“Mapping the Future Evolution of Atomic Scale Processing to Enable the World of Artificial Intelligence” Eric Joseph (IBM, USA)
11:45-12:00	Sponsor Preview
12:00-1:30	Lunch and Exhibits

ALD Invited Speakers

• Silvia Armini (IMEC, Belgium)
• Ageeth Bol (Eindhoven University of Technology, Netherlands)
• Jolien Dendooven (Ghent University, Belgium)
• Eric Dickey (Lotus Applied Technology, USA)
• John Ekerdt (University of Texas, Austin, USA)
• Fabio Grillo (ETH Zurich, Switzerland)
• Hyeongtag Jeon (Hanyang University, South Korea)
• Jessica Kachian (Intel, USA)
• Rajesh Krishnamurthy (TechInsights/Chipworks, Canada)
• Alex Martinson (Argonne National Laboratory, USA)
• Niloy Mukherjee (Eugenus, Inc., USA)
• Jin-Seong Park (Hanyang University, South Korea)
• Henrik Pedersen (Linkoping University, Sweden)
• Madhukar Rao (Versum Materials, USA)
• Dina Triyoso (Tokyo Electron, USA)
• Ginger Wheeler (U.S. Naval Research Laboratory, USA)

ALE Invited Speakers

• Tomoko Ito (Osaka University, Japan)
• Sabbir A. Khan (Niels Bohr Institute, University of Copenhagen, Denmark)
• Nobuyuki Kuboi (Sony Semiconductor Solutions Corp., Japan)
• Xu Li  (University of Glasgow, UK)
• Alfredo Mameli (TNO-Holst Centre, The Netherlands)
• Angelique Raley (TEL Technology Center, America, USA)
• Kazunori Shinoda (Hitachi Ltd, Japan)
• Samantha Tan (Lam Research, USA)